| 一种新型酞菁类光蚀刻记录材料的光生酸性质研究 |
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| 引用本文： | 黄蕾,宾月景,黄新,张复实.一种新型酞菁类光蚀刻记录材料的光生酸性质研究[J].影像科学与光化学,2007,25(2):142-146. |
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| 作者姓名： | 黄蕾 宾月景 黄新 张复实 |
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| 作者单位： | 清华大学, 化学系, 有机光电子与分子工程教育部重点实验室, 北京, 100084 |
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| 基金项目： | 国家自然科学基金
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国家重点基础研究发展计划(973计划) |
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| 摘 要： | 通过研究对甲苯磺酸酯空心酞菁的性质,发现该化合物在紫外光照射下可生酸,是一种光生酸剂.由于酞菁类化合物本身具有光催化氧化反应的性能,因此这类光生酸剂在光蚀刻技术中将有很好的应用潜能.
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| 关 键 词： | 化学增幅抗蚀剂 光生酸剂 光催化 酞菁 |
| 收稿时间： | 2006-10-23 |
Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials |
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| HUANG Lei,BIN Yue-jing,HUANG Xin,ZHANG Fu-shi.Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials[J].Imaging Science and Photochemistry,2007,25(2):142-146. |
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| Authors: | HUANG Lei BIN Yue-jing HUANG Xin ZHANG Fu-shi |
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| Institution: | Key Lab of Organic Optoelectronics and Molecular Engineering of Ministry of Education, Department of Chemistry, Tsinghua University, Beijing 100084, P. R. China |
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| Abstract: | A New Phthalocyanine derivative,the p-toluenesulfonylphthalocyanine was synthesized from metal-free phthalocyanine.The photolysis properties of the compound exposed with UV light was investigated.It was found that the p-toluenesulfonylphthalocyanine can generate acid after exposure.With good photocatalysis property,this photoacid-generator is applicable to chemically amplified photoresist. |
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| Keywords: | chemical amplification photoacid generator photo-catalysis phthalocyanine |
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