On the choice of the residual norm function in the interpretation of ARXPS data by regularized fitting |
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Authors: | R. W. Paynter M. Rondeau |
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Affiliation: | 1. INRS énergie Matériaux Télécommunications, 1650 Boulevard Lionel‐Boulet, Varennes, Québec J3X 1S2, Canada;2. Département de physique, Université de Sherbrooke, 2500 Boulevard de l'Université, Sherbrooke, Québec J1K 2R1, Canada |
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Abstract: | Angle‐resolved X‐ray photoelectron spectroscopy (ARXPS) data taken on a polystyrene film exposed to a nitrogen plasma are interpreted by the fitting of regularized depth profiles. Three ways of measuring the goodness of fit are compared—the χ2 statistic with variances drawn from the raw spectra, the χ2 statistic with variances drawn from the concentration figures obtained from the data analysis, and a simple sum of the squared differences (ssd) that does not require variances to be calculated. It is shown that for these data, the depth profiles obtained using an objective method for the choice of the regularization parameter are essentially identical irrespective of whether or how the variances are introduced into the calculation. Copyright © 2010 John Wiley & Sons, Ltd. |
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Keywords: | angle‐resolved X‐ray photoelectron spectroscopy polymer surface plasma modification Tikhonov regularization |
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