The influence of initial surface conditions on field crystallization of anodic aluminum oxide films determined by synchrotron X‐ray diffraction

X‐ray diffraction measurements were performed using synchrotron radiation at the SPring‐8 facility and electrochemical techniques to investigate the effect of polishing methods and storage conditions on the crystal structure of air‐formed oxide films and anodic oxide films formed on highly pure aluminum. Storage in an N₂ environment hinders local film breakdown during anodizing, and it was established that the X‐ray diffraction measurements showed the presence of a γ‐Al₂O₃ in the anodic oxide film formed on mechanically polished (MP) specimens. Formation of γ‐Al₂O₃ during anodizing was inhibited by electropolishing because of the removal of the work‐hardened layer that was formed on the MP by electro‐polishing. The X‐ray diffraction results do not show clear differences in the influence of the polishing method on the crystal structure of air formed oxide film. This is due to the very fast oxidation rate of the air‐formed oxide film and very long storage times for the X‐ray measurements. The anodic oxide film formed on aluminum, which has a very flat surface, shows color and the color depended on grain orientation. The electrochemical impedance of the MP specimen is slightly lower than that of the mechanically and then electrochemically polished specimen at the middle frequency range. This impedance difference may be due to formation of γ‐Al₂O₃ in the amorphous anodic oxide film and the thickness of the film. Copyright © 2010 John Wiley & Sons, Ltd.