Chloride‐based CVD of 3C‐SiC epitaxial layers on 6H(0001) SiC |
| |
Authors: | Stefano Leone Franziska C. Beyer Anne Henry Olof Kordina Erik Janzén |
| |
Affiliation: | Department of Physics, Chemistry and Biology, Link?ping University, 58 183 Link?ping, Sweden |
| |
Abstract: | The heteroepitaxial growth of 3C‐SiC on 6H‐SiC(0001) on‐axis substrates is demonstrated in this study. A hot‐wall CVD reactor working at a reduced pressure was used to perform growth experiments at temperatures between 1300 °C and 1500 °C. The addition of hydrogen chloride to standard precursors allowed a wide window of operating parameters, which resulted in the growth of very high quality and purity 3C‐SiC layers, with a morphology characterized largely by single‐domains, especially when nitrogen was intentionally added. Growth rate of 10 µm/h and n‐type background doping in the low 1015 cm–3 range were achieved. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
| |
Keywords: | semiconductors chemical vapour deposition silicon carbide epitaxy |
|
|