Experimental apparatus for investigation of sputtering and secondary ion emission induced by energetic ion beams |
| |
Authors: | Drozdziel A Pyszniak K Sielanko J Turek M Wójtowicz A |
| |
Affiliation: | Institute of Physics, Maria Curie-Sklodowska University, Pl. Marii Curie-Sklodowskiej 1, 20-031 Lublin, Poland. |
| |
Abstract: | The construction of an experimental apparatus, for investigation of implantation, secondary ion emission and sputtering processes, during irradiation of samples with an ion beam of up to 70 keV energy, is described. The basis of the apparatus is an electromagnetic mass separator equipped with a quadrupole mass spectrometer located in the collector chamber. The computer data acquisition control system makes it possible to perform the experimental measurements with high accuracy and precision. Preliminary results of secondary ion mass spectral measurements, obtained for C, Al, Si and Cu targets bombarded with Ar(+) and Kr(+) ions, are presented. |
| |
Keywords: | |
本文献已被 PubMed 等数据库收录! |
|