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Anisotropic corner diffusion as origin for dendritic growth on hexagonal substrates
Affiliation:1. Institut de Physique Expérimentale, EPF Lausanne, CH-1015 Lausanne, Switzerland;2. Center for Atomic-scale Materials Physics and Physics Department, Technical University of Denmark, DK-2800 Lyngby, Denmark;1. Institut FEMTO-ST, UMR 6174, CNRS, Univ. Bourgogne Franche-Comté, 15B, Avenue des Montboucons, 25030 BESANCON Cedex, France;2. Laboratoire Interdisciplinaire Carnot de Bourgogne (ICB), UMR 6303, CNRS Université Bourgogne Franche-Comté, 9, Avenue Alain Savary, BP 47 870, F-21078 DIJON Cedex, France;1. School of Materials Science and Engineering, Kyungpook National University, Daegu 702-701, Republic of Korea;2. School of Materials Science and Engineering, Hebei University of Technology, Tianjin 300-132, China;3. Light Metals Team, Korea Institute of Materials Science, Changwon 642-831, Republic of Korea;1. Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, Taiwan 30013, ROC;2. Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, Taiwan 30076, ROC;1. Key Laboratory of Opto-electronics Technology, Microelectronic School, Beijing University of Technology, Beijing, China, 100124;2. Institute of Microelectronics of Chinese Academy of Science, Beijing, China, 100029
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