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Reactive Phase Formation in Thin Film Metal/Metal and Metal/Silicon Diffusion Couples |
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| Authors: | Tomi Laurila Jyrki Molarius |
| Affiliation: | 1. Lab. of Electronics Production Technology, Helsinki University of Technology, P.O. Box 3000, FIN-02015 HUT, Finland;2. VTT Microelectronics, P.O. Box 1101, FIN-02044 VTT, Finland |
| Abstract: | |
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