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Plasmonic tuning of aluminum doped zinc oxide nanostructures by atomic layer deposition |
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| Authors: | Conor T. Riley Tien A. Kieu Joseph S. T. Smalley Si Hui Athena Pan Sung Joo Kim Kirk W. Post Alireza Kargar Dimitri N. Basov Xiaoqing Pan Yeshaiahu Fainman Deli Wang Donald J. Sirbuly |
| Affiliation: | 1. Department of NanoEngineering, University of California, , 92093 San Diego, La Jolla, USA;2. Department of Electrical and Computer Engineering, University of California, , 92093 San Diego, La Jolla, USA;3. Department of Materials Science and Engineering, University of Michigan, , 48109 Ann Arbor, Michigan, USA;4. Department of Physics, University of California, , 92093 San Diego, La Jolla, USA;5. Materials Science and Engineering, University of California, , 92093 San Diego, La Jolla, USA |
| Abstract: | Currently there is a strong interest in plasmonic materials operating in the near‐infrared (NIR), however, conventional metals such as gold and silver possess high optical losses in this region. In this work we demonstrate localized surface plasmon resonances (LSPRs) with low loss in the NIR region by utilizing atomic layer deposition to deposit thin films of aluminium doped zinc oxide onto silicon nanopillars created via nanopshere lithography. The deposited films have excellent conformality and the LSPRs can be tuned from the mid‐infrared to the NIR by controlling the doping concentration, deposition temperature and nanostructure morphology. (© 2014 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim) |
| Keywords: | plasmonics aluminum doping zinc oxide atomic layer deposition silicon nanopillars nanosphere lithography |