A comparative study of the dopant profiles in diffused planar optical waveguides by SIMS and guided wave probe |
| |
Authors: | R. A. Betts C. W. Pitt K. R. Riddle L. M. Walpita |
| |
Affiliation: | 1. Department of Electronic and Electrical Engineering, University College London, Torrington Place, WC1E 7JE, London, England
|
| |
Abstract: | A technique has been developed for dopant concentration depth profiling using static Secondary Ion Mass Spectrometry (SIMS), and an ex-situ ion milling facility to produce “tapers” through the region of interest of an optical waveguide sample. Results have been obtained for titanium-diffused optical waveguides in lithium niobate and for potassium and caesium ion-exchanged glass waveguides. The SIMS profiles have been compared with refractive index profiles in multimode structures. The refractive index profiles have been obtained from the waveguide mode spectra by a piecewise linear Wentzel-Kramers-Brillouin (WKB) method. The two profiles are in close agreement. Use of the SIMS technique for single mode Ti∶LiNbO3 waveguides has revealed significant changes in the forms of the profiles, compared with deeper structures, and we suggest a mechanism to account for these changes. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|