Gas contaminant effect in a discharge-excited ArF excimer laser |
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Authors: | T. Saito S. Ito |
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Affiliation: | (1) Opto-Electronics Research Laboratories, NEC Corporation, 1-1, Miyazaki, 4-chome, Miyamae-ku, Kawasaki, Kanagawa 216, Japan (Fax : +81-44/856-2224, E-mail: tsaito@oel.cl.nec.co.jp), JP |
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Abstract: | 4 , O2 and N2 in a discharge-excited ArF-excimer laser. Measured characteristics include laser pulse energy, small-signal gain, and laser spectrum. Measurement results indicate that laser pulse energy degradation for such impurities (<100 ppm) is mainly due to optical absorption. It has also been found that for O2 contaminants laser pulse energy degradation is strongly dependent on operational repetition rates; at higher repetition rates, an increased concentration of O2 impurities results in a reduced small-signal gain and a consequent decline in laser pulse energy. Received: 12 June 1997/Revised version: 3 December 1997 |
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Keywords: | PACS: 42.55 |
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