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Getter formation in silicon by implantation of antimony ions
Authors:P K Sadovskii  A R Chelyadinskii  V B Odzhaev  M I Tarasik  A S Turtsevich  Yu B Vasiliev
Institution:1. Belarusian State University, pr. Nezavisimosti 4, Minsk, 220030, Belarus
2. Open Joint Stock Company “Integral,”, ul. Kazintsa 121A, Minsk, 220108, Belarus
Abstract:A porous silicon layer as a getter of uncontrolled impurities has been prepared by implantation of Sb+ into silicon and subsequent thermal treatments. The lifetime of nonequilibrium charge carriers in n- and p-type silicon wafers with a getter layer is 3–4 times longer than that without a getter.
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