Selective growth of GaAs quantum dots and vertical quantum wires in two-dimensional V-grooves

We propose and demonstrate a novel technique for the fabrication of quantum dot (QD) structures using metal organic chemical vapor deposition (MOCVD). The GaAs quantum dots are grown at the bottom of the two-dimensional V-groove (2DVG) structures which are composed of (1 1 1)A and (1 1 1)B-facets on GaAs(1 0 0). The 2DVG is formed by MOCVD selective growth on a SiO₂ patterned substrate. It should be noted that the 2DVGs cannot be formed by a chemical wet etching technique because the facet's anisotropy of etching ratios are different. By changing the growth condition, we can obtain GaAs QD structures which have a size of less than 10 nm, and vertical GaAs quantum wires (V-QWRs) in 2DVGs. We have observed photoluminescence from each structure. We have also demonstrated stacking of GaAs QDs in the 2DVG on GaAs (1 0 0).