Effect of oxygen partial pressure on the structural and optical properties of ZnO film deposited by reactive sputtering

Effects of variation of the oxygen partial pressure on the structural and optical properties of zinc oxide (ZnO) thin films prepared by reactive radio-frequency sputtering were investigated. Measurements by X-ray diffraction (XRD) and atomic force microscopy (AFM) indicated that the crystallinity and the surface morphology were sensitive to the oxygen partial pressure. The interfacial and optical properties of the targeted films were investigated by spectroscopic ellipsometry (SE) characterization. Based on Tauc-Lorentz (TL) model, the optical constants of ZnO films were tentatively extracted in the photon energy ranging from 1.5 to 6.0 eV. Analyses by XRD and SE revealed that the oxygen partial pressure had effect on the orientation of the ZnO films, the surface morphology, the packing density, and the interfacial layers. And the relationship between crystallinity and interfacial layer, as well as the relationship between surface roughness and packing density was discussed. All these had a significant impact on the optical properties illustrated by SE analysis.