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In situ etch rate measurements of thin film combinatorial libraries
Authors:J.D. Perkins  M.F.A.M. van Hest  C.W. Teplin  M.S. Dabney  D.S. Ginley
Affiliation:National Renewable Energy Lab., Mail Stop 3211, 1617 Cole Blvd., Golden, CO 80401, USA
Abstract:We demonstrate the use of optical reflection mapping as an in situ characterization tool to evaluate the corrosion rate of compositionally graded thin film combinatorial libraries coated with a commercial glass etching paste. A multi-channel fiber-optically coupled CCD-array-based spectrometer was used to collect a series of reflectance maps from 300 to 1000 nm versus time. The thin film interference oscillations in the measured reflection spectra have been fitted to determine the film thickness as a function of time and thereby the etch rate. Application of this technique to an In-Mo-O composition spread library is presented as an example.
Keywords:78.20.Ci
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