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Influence of V and Mo overlayer on magneto-optical Kerr effect in ultrathin Co films
Authors:K Postava  Z Kurant  A Stupakiewicz  A Wawro  T Yamaguchi
Institution:a Research Institute of Electronics, Shizuoka University, Johoku 3-5-1, Hamamatsu 432-8011, Japan
b Laboratory of Magnetism, Institute of Experimental Physics, University of Bialystok, 41 Lipowa Street, 15-424 Bialystok, Poland
c Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, 02-668 Warsaw, Poland
d Department of Physics, Technical University of Ostrava, 17 Listopadu 15, 708 33 Ostrava-Poruba, Czech Republic
Abstract:A method for characterization of sub-nanometer thick Co/V and Co/Mo interfaces is proposed that uses magneto-optical ellipsometry. Both the polar Kerr rotation and ellipticity are fitted simultaneously to different models of interface layer. The magneto-optical data are measured for varying thicknesses of the cobalt layer and overlayer by scanning of a laser beam over the samples with two orthogonal wedges. Decrease of magneto-optical effect at both interfaces Co/V and Co/Mo were observed, which corresponds to interface layers of thicknesses ranging from one to two monoatomic layers. In the case of vanadium, the interface layer is sharper and can be explained either by reduced magnetic moment of cobalt, or by anti-parallel magnetic moment of vanadium near the Co/V interface.
Keywords:78  20  Ls  75  70  Ak  75  70  Cn  75  60  _method=retrieve&  _eid=1-s2  0-S0169433207009622&  _mathId=si1  gif&  _pii=S0169433207009622&  _issn=01694332&  _acct=C000069490&  _version=1&  _userid=6211566&  md5=3f5465d0b07fb9308db7553306f5d0a3')" style="cursor:pointer  &minus" target="_blank">" alt="Click to view the MathML source" title="Click to view the MathML source">&minus  d
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