Two-step nitridation of photocatalytic TiO2 films by low energy ion irradiation |
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Authors: | Masahisa Okada Yasusei Yamada Pin Jin Masato Tazawa Kazuki Yoshimura |
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Affiliation: | National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Anagahora, Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan |
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Abstract: | Nitridation of TiO2 films is performed by the simultaneous irradiation of low-energy N2+ and H2+ ions under substrate-heating condition. Spectroscopic observations of the resultant films clarify the formation of nitrogen-substituted TiO2 (TiO2−xNx) with large N fractions and the agglomeration of undesirable oxynitride species attributed to the deep states in the band gap. We find that the addition of a thin TiO2 cap layer on the ion-irradiated films improves the nitrogen bonding structure and distribution near the surfaces, leading to a good photocatalytic performance even in the visible region. |
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Keywords: | 79.60.&minus i 81.15.Cd 81.65.Lp 82.65.+r |
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