Adsorption and film growth of N-methylamino substituted triazoles on copper surfaces in hydrocarbon media

The adsorption of benzotriazole (BTA), tolyltriazole (TTA) and two different N-methylaminosubstituted triazoles on copper surfaces in hydrocarbon media has been examined by in situ ellipsometry and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). All four triazoles were found to form films and from the ellipsometric study were the film thicknesses estimated to be in the range of 0.5-2 nm after 1000 min exposure time. The layers formed from BTA and TTA were thicker (up to 2 nm) than the layers from N-aminomethyl substituted triazoles (roughly 0.5 nm). Desorption was studied qualitatively and 20% or less of the adsorbed material were found to desorb. The ToF-SIMS study showed that while BTA and TTA adsorbed intact did the N-aminomethyl substituted triazoles appear to loose their aminomethyl tails on binding since only signals corresponding to triazole moieties of the compounds were detected.