Combinatorial arc plasma deposition search for Ru-based thin film metallic glass

We have discovered a novel Ru-based thin film metallic glass (TFMG) using combinatorial arc plasma deposition (CAPD). To search for Ru-based TFMG, alloy systems of Ru-Zr-Al, Ru-Zr-Fe and Ru-Zr-Mo were investigated by making libraries. Each library consisted of 1089 CAPD samples deposited on a substrate by CAPD. Composition of each sample is different with each other.The composition and phases of the CAPD samples were measured by energy dispersive X-ray fluorescence spectrometry and X-ray diffractometry, respectively. Results showed the amorphous regions depended on the additive elements Al, Fe or Mo. Compared with the addition of Al, the addition of Fe or Mo exhibited high amorphous forming ability.To evaluate the mechanical properties, the glass transition temperature T_g and the crystallization temperature T_x of the amorphous samples in each Ru-Zr-X alloy, larger samples having the same compositions as the typical amorphous CAPD samples were reproduced by sputtering because the CAPD samples were too small to measure the mechanical properties, T_g and T_x.Ru₆₅Zr₃₀Al₅ and Ru₆₇Zr₂₅Al₈ samples were found to exhibit the better fracture stress and elastic limit than conventional TFMGs, while Ru-Zr-Fe and Ru-Zr-Mo samples were found to be brittle. DSC revealed that the Ru₆₅Zr₃₀Al₅ sample was a TFMG, with a T_g of 902 K and T_x of 973 K.