Quantitative analysis of thin-film conductivity by scanning microwave microscope |
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Authors: | Sohei Okazaki Yasushi Hirose Taro Hitosugi Toshihiro Shimada Tetsuya Hasegawa |
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Affiliation: | a Department of Chemistry, The University of Tokyo, Tokyo 113-0033, Japan b Institute of Health Biosciences, The University of Tokushima Graduate School, Tokushima 770-8505, Japan c Kanagawa Academy of Science and Technology, Kawasaki 213-0012, Japan |
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Abstract: | We propose a novel method for high-throughput quantitative analysis of thin-film conductivity σ by using a scanning microwave microscope (SμM). We demonstrated that composition spread thin films of Ti1-xNbxO2 can be utilized as a standard reference in a wide σ range. The shift in Q-value measured by SμM along the composition-spread axis showed a single peak, which moved to the lower x side with film thickness. This behavior was confirmed by electrical field simulation using the finite element method. |
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Keywords: | 02.60.&minus x 07.79.&minus v 71.30.+h 84.40.&minus x |
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