Morphology engineering of monolayer MoS2 by adjusting chemical environment during growth |
| |
| Affiliation: | 1. Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, 518060, Shenzhen, PR China;2. Physics Faculty, Taras Shevchenko National University of Kyiv, 01601, Kyiv, Ukraine |
| |
| Abstract: | The precise control of the morphology of monolayer MoS2 is of particular importance for their potential applications and device performance. In this work, we present an experimental method to study the shape evolution of the chemical vapor deposition (CVD) grown MoS2 flakes. We observed that the morphology of monolayer MoS2 flakes transformed from truncated triangular shape to triangular shape by increasing the stoichiometric ratio of S:Mo, and consequently tailor the optical properties of MoS2 flakes. The results suggest the possibility to engineer the morphology of monolayer MoS2 by adjusting the chemical environment during growth. |
| |
| Keywords: | Chemical vapor deposition Nanorods |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
