Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system

We study the co-existing four-wave mixing (FWM) process with two dressing fields and the six-wave mixing (SWM) process with one dressing field in a five-level system with carefully arranged laser beams. We also show two kinds of doubly dressing mechanisms in the FWM process. FWM and SWM signals propagatingalong the same direction compete with each other. With the properly controlled dressing fields, the FWM signals can be suppressed, while the SWM signals have been enhanced.