ArF laser photolytic deposition and thermal modification of an ultrafine chlorohydrocarbon |
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Authors: | Josef Pola Anna Galíková Jan Šubrt Akihiko Ouchi |
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Institution: | (1) Materials Science Centre, Indian Institute of Technology, Kharagpur, 721302, India;(2) Department of Electrical Engineering, Indian Institute of Technology, Kharagpur, 721302, India; |
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Abstract: | MW ArF laser irradiation of gaseous cis-dichloroethene results in fast decomposition of this compound and in deposition of solid ultrafine Cl- and H-containing carbonaceous
powder which is of interest due to its sub-microscopic structure and possible reactive modification of the C-Cl bonds. The
product was characterized by electron microscopy, and FTIR and Raman spectra and it was revealed that HCl, H2, and C/H fragments are lost and graphitic features are adopted upon heating to 700°C. |
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