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ArF laser photolytic deposition and thermal modification of an ultrafine chlorohydrocarbon
Authors:Josef Pola  Anna Galíková  Jan Šubrt  Akihiko Ouchi
Institution:(1) Materials Science Centre, Indian Institute of Technology, Kharagpur, 721302, India;(2) Department of Electrical Engineering, Indian Institute of Technology, Kharagpur, 721302, India;
Abstract:MW ArF laser irradiation of gaseous cis-dichloroethene results in fast decomposition of this compound and in deposition of solid ultrafine Cl- and H-containing carbonaceous powder which is of interest due to its sub-microscopic structure and possible reactive modification of the C-Cl bonds. The product was characterized by electron microscopy, and FTIR and Raman spectra and it was revealed that HCl, H2, and C/H fragments are lost and graphitic features are adopted upon heating to 700°C.
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