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In situ monitoring of ZnO formation by photoemission spectroscopy |
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| Authors: | Suttinart Noothongkaew Ratchadaporn Supruangnet Worawat Meevasana Hideki Nakajima Sukit Limpijumnong Prayoon Songsiriritthigul |
| Affiliation: | a Synchrotron Light Research Institute, Nakhon Ratchasima 30000, Thailand b School of Physics, Suranaree Univ. of Tech., Nakhon Ratchasima 30000, Thailand c Department of Physics, Stanford University, Stanford, CA 94305, USA d ThEP Center, Commission on Higher Education, Bangkok 10400, Thailand |
| Abstract: | Exposure of a clean Zn metal to oxygen in ultra high vacuum provides a mean to gradually form ZnO. With in situ synchrotron photoelectron measurement, the progressive change in the spectra with the oxygen exposure time is observed. The analysis of the spectra allows the determination of ZnO formation. It was found that the oxidation process takes place until reaching the critical thickness, at which the oxidation rate reduces greatly to nearly zero. The critical thickness was determined to be about 2 monolayers. |
| Keywords: | 82.40.&minus g 82.65.+r 68.47.Gh 79.60&minus i |
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