Microstructure and discharge properties of Mg-Zr-O protective films in plasma display panel |
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Authors: | Jianfeng Wang Zhongxiao Song Kewei Xu Chunliang Liu |
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Affiliation: | a State Key Laboratory for Mechanical Behavior of Materials, Xi’an Jiaotong University, Xi’an 710049, China b Key Laboratory of Electronic Physics and Devices of Ministry of Education, Xi’an Jiaotong University, Xi’an 710049, China |
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Abstract: | Mg-Zr-O protective films for plasma display panels (PDPs) were deposited on soda-lime glass substrates by magnetron sputtering method. The effects of Zr doping on both the discharge properties (firing voltage, Vf and the minimum sustaining voltage, Vs) and the microstructure of the Mg-Zr-O films were investigated. The results show that the deposited Mg-Zr-O films retain the NaCl-type structure as the pure MgO crystal. The doped Zr exists in the form of Zr4+ substitution solution in MgO crystal and an appropriate amount of Zr can improve the surface characteristics of the Mg-Zr-O films effectively. When the Zr atomic concentration is about 2%, the Mg-Zr-O films have the strongest (2 0 0) preferred orientation and the minimum surface roughness. The firing voltage and the minimum sustaining voltage of Mg-Zr-O protective layer are reduced at most by about 25 V and 15 V, respectively, compared with those of the pure MgO film. Mg-Zr-O protective layers with an appropriate amount of Zr are promising to meet the demands of advanced high-vision PDPs. |
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Keywords: | Plasma display panel Mg-Zr-O film Magnetron sputtering Microstructure Discharge |
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