Towards chemical state resolution in regularized depth profiles derived from ARXPS data taken on plasma-oxidized polystyrene |
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| Authors: | R.W. Paynter |
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| Affiliation: | INRS, Énergie Matériaux Télécommunications, 1650 boul. Lionel-Boulet, Varennes, Québec J3X 1S2, Canada |
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| Abstract: | ARXPS data obtained from a plasma-oxidized polystyrene sample were evaluated by means of 3-parameter and 10-parameter depth profile models, with and without regularization. It was found that the partially regularized 3-parameter model gave equivalent results compared to the regularized 10-parameter model, but requiring one fifteenth of the computational effort. |
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| Keywords: | Angle-resolved X-ray photoelectron spectroscopy Polymer surface Tikhonov regularization |
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