An optical differential reflectance study of adsorption and desorption of xenon and deuterium on Ni(111) |
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Authors: | A Wong X D Zhu |
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Institution: | (1) Department of Physics, University of California, 95616 Davis, CA, USA |
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Abstract: | We studied adsorption and desorption of Xe and deuterium on Ni(111) using an optical differential reflectance technique. The main findings are: (i) the differential reflectance varies almost linearly with the surface densities of deuterium and Xe adatoms, and the signals can be described well with a three-layer model and the known dielectric responses of the surface layers: (ii) the adsorption of deuterium atT = 120 K follows the Langmuir kinetics, while the adsorption of Xe atT = 38 K follows the zeroth-order kinetics; (iii) nearT = 70 K, the rate of Xe desorption is almost coverage-independent with an activation energy ofE
des = 4.4 ± 0.2 kcal/mol. Our analysis suggests that the Xe desorption is likely to be dominated by the escape rate from the corners of two-dimensional Xe islands. |
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Keywords: | 78 66 82 65 |
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