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Single-electron tunneling in silicon-on-insulator nano-wire transistors
Authors:K. H. Cho   S. H. Son   S. H. Hong   B. C. Kim   S. W. Hwang   D. Ahn   B. -G. Park   B. Naser   J. -F. Lin   J. P. Bird  D. K. Ferry
Abstract:The gate bias dependent evolution of the Coulomb oscillations in a silicon-on-insulator nano-wire transistor is reported. Transport data obtained for a wide range of front- and back-gate bias strongly suggest that multiple quantum dots (QDs) with different potential depths are formed in the nano-wire channel. Our data can be clearly interpreted as arising from the turning on or off of one of these QDs as the back-gate bias is varied. Quantitative calculation based on the model of single-electron tunneling through two parallel QDs is in reasonable agreement with the measured data in the back-gate bias range where the third dot is not activated.
Keywords:SOI   Nano-wire   Single-electron tunneling   Potential fluctuation
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