Evolution of microcrystalline growth pattern by ultraviolet spectroscopic ellipsometry on Si:H films prepared by Hot-Wire CVD

Ultra-violet spectroscopic ellipsometry has been applied successfully to determine the evolution of μc-Si:H film structure, including incubation layer, bulk layer and the growth zone and surface over-layer, their individual thickness and composition. In view of the availability of a significantly high atomic H density in H₂-diluted SiH₄ ensemble in Hot-Wire CVD, microcrystallization seems to be achieved easily at a low substrate temperature. Atomic H induced etching at the growing network has been identified as instrumental in controlling the microcrystallization in Si:H. Sharp elimination of the incubation layer as well as surface roughness and significant improvement in the overall crystallinity was obtained on increase in H₂ dilution to SiH₄. A H₂ dilution limited sharp transition from an amorphous dominated (a+μc)-Si mixed phase to a virtually amorphous free μc-Si phase has been identified. However, enhanced atomic H reactivity at the growth zone beyond the attainment of the amorphous free bulk and the surface layer induces porosity in the network and a gradual deviation from crystallinity.