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强流电子束泵浦XeCl准分子激光动力学模型
引用本文:屠琴芬 张建泉. 强流电子束泵浦XeCl准分子激光动力学模型[J]. 强激光与粒子束, 1991, 3(3): 356-366
作者姓名:屠琴芬 张建泉
作者单位:西北核技术研究所(屠琴芬,张建泉,高占鹏),西北核技术研究所(杨国龙)
摘    要:强流电子束泵浦XeCl准分子激光动力学模型由三部分组成,即电子束能量沉积的计算;电子温度、电子反应速率的计算和化学/激光动力学。这个模型可以准确地预报小信号增益、吸收等激光特征量的时间变化规律。 该模型是在文献[1]、[2]、[3]报导的动力学模型的基础上提出的。采用四阶龙格_库塔法在VAX—11/780机器上进行数值求解。 计算给出XeCl准分子激光反应过程中各种粒子浓度、小信号增益、吸收、输出光强、激发速率以及平均电子能量随时间的变化规律。计算结果表明本征效率是激发速率,电流密度和工作气体(Ne/Xe/HCl)的各分压比的函数。 该模型可为高功率准分子激光器的研制提供设计参数和最佳实验条件。

关 键 词:准分子 激光动力学 XeCl

KINETIC MODEL OF ELECTRON-BEAM-PUMPED XeCl LASERS
Tu Qinfen,Zhang Jianquan,Gao Zhanpeng,and Yang Guolong. KINETIC MODEL OF ELECTRON-BEAM-PUMPED XeCl LASERS[J]. High Power Laser and Particle Beams, 1991, 3(3): 356-366
Authors:Tu Qinfen  Zhang Jianquan  Gao Zhanpeng  and Yang Guolong
Affiliation:Northwest Institute of Nuclear Technology
Abstract:A kinetic model for electron - beam pumping XeCl excimer laser consists of an e-beam deposition calculation, electron temperature and electron-reaction rate calculation, and chemical/laser kinetics codes, which can precisely predict time-dependent behavior of optical gain and absorption.This mode is based on the "kinetic model for long-pulse XeCl laser performance" by Dr. Levin[2], the "Theoretical simulation of electron-beam-excited Xenon-Chloride (XeCl) lasers "by Dr. Kannai[1], and the "Radiative and kinetic mechanisms in Bound-Free Excimer Lasers "by Dr. Werner[3]. A set of equations are solved numerically using the fourth-degree Runge-Kutta methode on VAX-11/780 computer.The temporal evolution of the various species involved, gain, absorption and laser output intensity along with excitation rate and electron energy during lasing for XeCl excimer lasers are computed. The results have shown that the intrinsic efficiency is a function of excitation rate, cur-, rent density and ratio of Ne/Xe/HCl mixture.
Keywords:excimer laser kinetics   numerical simulation   energy deposition.  
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