Selective tungsten deposition into ordered nanohole arrays of anodic porous alumina by electron-beam-induced deposition

The selective deposition of a metal (tungsten) into ordered nanohole arrays of an anodic porous alumina membrane was performed using an electron-beam-induced deposition process. After deposition, the membrane was observed and analyzed using electron microscopy and energy-dispersive X-ray spectroscopy. It is shown that the deposition was preferentially conducted in the holes in the irradiated area of the electron beam. A calculation of the electron-beam intensity explains the reason for the preferential deposition in the holes. PACS 81.07.-b; 81.16.Rf; 61.46.+w