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Dissipative light mask generated by a nonuniformly polarized field for atomic lithography |
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| Authors: | O. N. Prudnikov A. V. Taĭchenachev A. M. Tumaĭkin V. I. Yudin |
| Affiliation: | (1) Novosibirsk State University, ul. Pirogova 2, Novosibirsk, 630090, Russia;(2) Institute of Laser Physics, Siberian Division, Russian Academy of Sciences, pr. Lavrent’eva 13/3, Novosibirsk, 630090, Russia |
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