一种新型深紫外正型光致抗蚀剂材料的研究

通过松香酸和丙烯酸的Diels-Alder反应得到了一种二酸——丙烯海松酸.丙烯海松酸有大的脂环结构和良好的成膜性,在固体膜层中,它可以和二乙烯基醚,如1,3-二乙烯氧基乙氧基苯,在加热条件下(80℃以上)发生反应,产物在稀碱水中难溶.这样形成的产物在光产酸剂产生的强酸催化下,在温度高于100℃时,可以迅速分解,从而变成稀碱水易溶.因此,用此二酸、二乙烯基醚和产酸剂可组成一种正型的光致抗蚀剂,当用254 nm的低压汞灯曝光时,其感度在30 mJ/cm²以下.

Studies on a Novel Deep UV Positive Photoresist Material

Acrylpimaric acid,a diacid with alicyclic structure and good film-forming property,was prepared by the Diels-Alder reaction of abietic acid and acrylic acid.The diacid could react with divinyl ether,such as 1,3-divinyloxyethoxybenzene,in solid film when baked above 80 ℃ and the film became insoluble in dilute base aqueous.Thus formed compound can be quickly decomposed at the presence of strong acid generated by photoacid generator(PAG) above 100 ℃ and become easily soluble in dilute aqueous base.A positive photoresist could be formed by the diacid,divinyl ether and PAG.The measured photosensitivity is less than 30 mJ/cm~2 when exposed to low pressure Hg lamp(254 nm).