| Fabrication and Thickness Measurment of the Thin Films Deposited by Planar Magnetron Sputtering |
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| 作者姓名： | SHAO Jian-da FAN Zheng-xiu YI Kui YIN Gong-jie YUAN Lixiang |
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| 作者单位： | Shanghai Institute of Optics and Fine Mechanics，Academia Sinica，P. O. Box800-211，Shanghai 201800，China |
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| 摘 要： | ＦａｂｒｉｃａｔｉｏｎａｎｄＴｈｉｃｋｎｅｓｓＭｅａｓｕｒｍｅｎｔｏｆｔｈｅＴｈｉｎＦｉｌｍｓＤｅｐｏｓｉｔｅｄｂｙＰｌａｎａｒＭａｇｎｅｔｒｏｎＳｐｕｔｔｅｒｉｎｇ￥ＳＨＡＯＪｉａｎ－ｄａ；ＦＡＮＺｈｅｎｇ－ｘｉｕ；ＹＩＫｕｉ；ＹＩＮＧｏｎｇ－ｊｉ...
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| 收稿时间： | 1993/11/17 |
Fabrication and Thickness Measurment of the Thin Films Deposited by Planar Magnetron Sputtering |
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| SHAO Jian-da, FAN Zheng-xiu, YI Kui, YIN Gong-jie, YUAN Lixiang.Fabrication and Thickness Measurment of the Thin Films Deposited by Planar Magnetron Sputtering[J].中国激光(英文版),1994,3(1):69-75. |
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| Authors: | SHAO Jian-da FAN Zheng-xiu YI Kui YIN Gong-jie YUAN Lixiang |
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| Abstract: | Reported here is a new method, low angle x -ray diffraction, of investigation theminimal thickness of thin films for various materials, and those of W, C, Mo, Si thin films deposited by planar magnetron sputering have been presented. |
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| Keywords: | minimal continous thichness low angle x -ray diffraction sputterting deposition |
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