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高工作电压GaAs HFET
引用本文:陈正廉,林罡.高工作电压GaAs HFET[J].固体电子学研究与进展,2019,39(2):106-110.
作者姓名:陈正廉  林罡
作者单位:南京电子器件研究所,南京,210016;南京电子器件研究所,南京,210016
摘    要:通过对结构和性能的分析与优化,设计并研制了不同场板和宽槽条件下的高工作电压GaAs HFET器件。直流和射频测试结果表明:提升场板长度和宽槽宽度可以有效提高器件的工作电压。器件在南京电子器件研究所流片,最终制备出的器件性能为:击穿电压大于84 V,在20 V工作电压下截止频率为9 GHz,3 GHz时功率增益为15.87 dB、功率附加效率为53%。

关 键 词:GaAs异质结场效应管  场板  宽槽  工作电压

High Operating Voltage GaAs HFET
CHEN Zhenglian,LIN Gang.High Operating Voltage GaAs HFET[J].Research & Progress of Solid State Electronics,2019,39(2):106-110.
Authors:CHEN Zhenglian  LIN Gang
Institution:(Nanjing Electronic Devices Institute,Nanjing,210016,CHN)
Abstract:High operating voltage GaAs HFETs with different field-plates and wide-recesses were designed and fabricated after performance analysis and structure optimization.The DC test and RF test results indicate that increasing wide-recess and field-plate can improve operating voltage of device?The device is fabricated in Nanjing Electronic Devices Institute.The final performances of device are that breakdown voltage is greater than 84 V,cut-off frequency is 9 GHz at 20 V,power gain is 15.87 dB and power added efficiency is 53%at 3 GHz.
Keywords:GaAs heterojunction field effect transistor(HFET)  field-plate  wide-recess  operating voltage
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