Effect of uniaxial stress on InSbtunnel junctions |
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Authors: | CW Fischer EL Heasell |
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Institution: | Department of Physics, University of Guelph, Guelph, Ontario, Canada;Department of Electrical Engineering, University of Waterloo, Waterloo Ontario, Canada |
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Abstract: | The deformation potential constants of heavily doped InSb have been determined by applying uniaxial stress to p-n tunnel junctions formed below the surface of rectangular InSb bars. Stress applied parallel to the major axes of these bars and parallel to the junction plane resulted in a linear decrease in tunnel current as a function of stress. The percentage decreases were 24·5 × 10?3, 9·5 × 10?3 and 4·5 × 10?3cm2kg?1 for stress applied parallel to 010], 11¯0], and 111] directions respectively. The observed changes in tunnel currents are attributed to a decrease in the tunnel probability produced by a shift in the conduction band edge relative to that of the valence band. Our data is consistent with a hydrostatic deformation potential of — 10 eV, and valence band deformation potentials b = ? 1·3 eV and d = ?7·4 eV. |
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