Effect of substrate doping concentration on quantum well states of Pb island grown on Si(1 1 1) |
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Authors: | Xieqiu Zhang Baikui Li Fangfei Ming Xudong Xiao |
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Institution: | a Department of Physics, The Chinese University of Hong Kong, Hong Kong, China b Department of Physics, The Hong Kong University of Science and Technology, Hong Kong, China |
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Abstract: | The interaction between the metallic film/island and the semiconductor substrate is important to the electronic properties of metallic nanostructure grown on semiconductor substrate. Here, we report a series of comparison experiments to investigate the effect of doping concentration of Si substrates on the quantum well state (QWS). Using scanning tunneling microscopy, we observed that the apparent QWS energy positions show a strong dependence on the substrate used and on the sample temperature. Further experimental results by varying the height of scanning tunneling microscope tip over the Pb island uncovered that the observed apparent QWS energy position changes mainly come from the partial bias voltage drop on the combined resistance of the Pb wetting layer and the substrate, which is comparable with the vacuum tunneling resistance at low temperatures. |
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Keywords: | Scanning tunneling microscopy Scanning tunneling spectroscopy Lead Silicon Metal-semiconductor interfaces |
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