Characteristics of Diffraction Gratings Fabricated by the Two-Beam Interference Method Using Photosensitive Hybrid Gel Films |
| |
Authors: | Tohge Noboru Ueno Ryuichi Chiba Fumio Kintaka Kenji Nishii Junji |
| |
Affiliation: | (1) Department of Metallurgical Engineering, Kinki University, 3-4-1, Kowakae, Higashi-Osaka, Osaka, 577-8502, Japan;(2) Department of Optical Materials, Osaka National Research Institute, AIST 1-8-31, Midorigaoka, Ikeda, Osaka, 563-8577, Japan |
| |
Abstract: | Diffraction gratings of arbitrary periods have been fabricated by the two-beam interference method using photosensitive ZrO2 gel films and characterized. The ZrO2 gel films were formed on Si or silica glass substrates from sols that were derived from Zr-butoxide modified chemically with benzoylacetone. The gel films were irradiated with two interference beams from a He-Cd laser (325 nm) and then leached in ethyl alcohol. The above process gave uniform surface-relief gratings of periods ranging from 1.0 to 0.5 m, depending on the incidence angle of the interference beams. The diffraction efficiency, measured in the Littrow configuration using a He-Ne laser (633 nm), showed polarization dependence for the grating of 0.5 m period but not for the gratings of 1.0 m period. The maximum diffraction efficiency was 18% for the grating of 1.0 m period and 28% for that of 0.5 m period in the reflection mode. The present study has proved that the photosensitive gel films are versatile in fabrication of optical devices. |
| |
Keywords: | chemical modification photosensitivity ZrO2 films diffraction gratings two-beam interference method |
本文献已被 SpringerLink 等数据库收录! |
|