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Fabrication of atomically smooth SrRuO3 thin films by laser molecular beam epitaxy
Authors:GuoZhen Liu  Meng He  KuiJuan Jin  GuoZhen Yang  HuiBin Lü  Kun Zhao  ShiJian Zheng and XiuLiang Ma
Institution:(1) Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100080, China;(2) Department of Mathematics and Physics, China University of Petroleum, Beijing, 102249, China;(3) Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016, China
Abstract:High-quality SrRuO3 (SRO) thin films and SrTiO3/SRO bilayer were grown epitaxially on SrTiO3 (STO)(001) substrates by laser molecular beam epitaxy. The results of in situ observation of reflection high-energy electron diffraction and ex situ X-ray diffraction ϑ-2ϑ scan indicate that the SRO thin films have good crystallinity. The measurements of atomic force microscopy and scan tunneling microscopy reveal that the surface of the SRO thin film is atomically smooth. The resistivity of the SRO thin film is 300 μΘ·cm at room temperature. Furthermore, the transmission electron microscopy study shows that the interfaces of STO/SRO and SRO/STO are very clear and no interfacial reaction layer was observed. The experimental results show that the SRO thin film is an excellent electrode material for devices based on perovskite oxide materials. Supported by the National Natural Science Foundation of China (Grant No. 10334070)
Keywords:SrRuO3 thin film  laser molecular beam epitaxy  surface morphology
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