| 光纤原料四氯化硅中微量三氯氢硅的气相色谱分析 |
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| 引用本文： | 李卜森,朱新芳,张琪.光纤原料四氯化硅中微量三氯氢硅的气相色谱分析[J].色谱,1994,12(2):108-109. |
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| 作者姓名： | 李卜森 朱新芳 张琪 |
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| 作者单位： | 中国科学院上海原子核研究所 |
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| 摘 要： | 采用石英毛细管柱与氩检测器相联结的气相色谱方法定量检测高纯的光纤原料四氯化硅中微量三氯氢硅等含氢杂质。该方法简单、可靠，三氯氢硅的检测下限达０．１×１０￣（－６）Ｗ／Ｗ。
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| 关 键 词： | 气相色谱 三氯氢硅 四氯化硅. 氩检测器 |
Gas Chromatographic Determination(GC) of Trace Trichlorosilane in High Purity Silicon Tetrachloride for Optical Fibers |
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| Li Busen , Zhu Xinfang and Zhang Qi.Gas Chromatographic Determination(GC) of Trace Trichlorosilane in High Purity Silicon Tetrachloride for Optical Fibers[J].Chinese Journal of Chromatography,1994,12(2):108-109. |
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| Authors: | Li Busen Zhu Xinfang and Zhang Qi |
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| Abstract: | GC method for detemining trace SiHCl_3 in high purity SiCl_4 has been developed. The methed,using afused sinica capillary column for separation and a sensitive argon detector for quantitative determination of someimpurities of ppm level,is simple, stable and reliable. the minimum detectable concentration was 0.1 ppm forSIHCl_3. This GC system is resisting to corrosion of the sample in the long run. |
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| Keywords: | gas chromatography SiHCl_3 SiCl_4 argon detector |
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