| a-C∶H(N)薄膜结构的X射线光电子能谱分析 |
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| 引用本文： | 程宇航,吴一平,陈建国,乔学亮,谢长生,杨业智,莫少波.a-C∶H(N)薄膜结构的X射线光电子能谱分析[J].物理学报,1998,47(1):83-88. |
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| 作者姓名： | 程宇航 吴一平 陈建国 乔学亮 谢长生 杨业智 莫少波 |
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| 作者单位： | 华中理工大学塑性成型模拟及模具技术国家重点实验室，武汉 430074;华中理工大学塑性成型模拟及模具技术国家重点实验室，武汉 430074;华中理工大学塑性成型模拟及模具技术国家重点实验室，武汉 430074;华中理工大学塑性成型模拟及模具技术国家重点实验室，武汉 430074;华中理工大学塑性成型模拟及模具技术国家重点实验室，武汉 430074;武汉大学分析测试中心，武汉 430072;武汉大学分析测试中心，武汉 430072 |
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| 摘 要： | 采用直流-射频等离子增强化学汽相沉积技术制备a-C∶H(N)薄膜，用X射线光电子能谱研究了混合气体中N2含量对薄膜成分与结构的影响.a-C∶H(N)薄膜中含氮量可达9.09%.对a-C∶H(N)薄膜的C1s和N1s结合能谱的分析表明a-C∶H(N)薄膜的结构是由C3N4相镶嵌在sp2键结合的CNx基体中组成.其中C3N4相中N和C原子比接近4∶3，不随薄
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| 收稿时间： | 1997-03-17 |
STUDY ON THE STRUCTURE OF a-C∶H(N) FILMS BY XPS |
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| CHENG YU-HANG,WU YI-PING,CHEN JIAN-GUO,QIAO XUE-LIANG,XIE CHANG-SHENG,YANG YE-ZHI and MUO SHAO-BO.STUDY ON THE STRUCTURE OF a-C∶H(N) FILMS BY XPS[J].Acta Physica Sinica,1998,47(1):83-88. |
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| Authors: | CHENG YU-HANG WU YI-PING CHEN JIAN-GUO QIAO XUE-LIANG XIE CHANG-SHENG YANG YE-ZHI and MUO SHAO-BO |
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| Abstract: | The a-C∶H(N) films was deposited from the mixture of C2H2 and N2 by rf-dc plasma enhanced chemical vapor deposition. The influence of N2 percentage in the mixture on the composition and structure of a-C∶H(N) films was studied by XPS. As the N2 percentage in the feed gas was increased from 0% to 75%, up to 9.09% N was incorporated in the film. The results of analysing C1s and N1s core level indicated that a-C∶H(N) films are consisted of stoichiometry C3N4 phase and CHx matrix which is identified as predominantly sp2 bonded structure. The N/C ratio of C3N4 phase is near 4/3. The N atoms incorporated in the films is useful to increase the content of C3N4 phase and sp3/sp2 ratio. |
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