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Tunneling magnetoresistance and electroresistance properties of composite‐barrier ferroelectric tunnel junctions
Authors:A. Petraru  R. Soni  H. Kohlstedt
Affiliation:Nanoelektronik, Technische Fakult?t Kiel, Christian‐Albrechts‐Universit?t zu Kiel, 24143 Kiel, Germany
Abstract:The multiferroic properties of ferroelectric tunnel junctions with a composite barrier comprising a fully epitaxial La0.7Sr0.3MnO3/BaTiO3/SrTiO3/La0.7Sr0.3MnO3 heterostructure are reported in this study. The patterned junctions having extended top electrodes show tunnel magnetoresistance ratios ranging from 20% to 110% at 77 K. Furthermore, tunneling electroresistance – induced by ferroelectric polarization switching and showing two‐state memory effect in the dynamic resistance – has also been observed in these junctions. Thus, with the concurrence of tunneling electroresistance and magnetoresistance, these tunnel junctions serve as memory devices with four resistance states. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Keywords:ferroelectrics  thin films  tunnel junctions  oxides
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