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Mechanism of nucleophilic substitution at silicon: kinetic evidence on the slow formation of a pentacoordinate silicon intermediate
Authors:Robert J.P. Corriu  Bernard J.L. Henner
Affiliation:Laboratoire des Organométalliques, Equipe de Recherche Associée au C.N.R.S. No. 554, Université des Sciences et Techniques du Languedoc, 34060 Montpellier Cédex France
Abstract:Kinetic studies of various coupling reactions between silicon derivatives (SiF, SiCl, SiOMe, SiH) and organometallic reagents (RMgX, RLi) were performed for systems involving retention and inversion of configuration. The results show that for both stereochemical courses, the rupture of the SiX bond is not the rate determining step. Results are in good agreement with the rate determining formation of a pentacoordinate silicon intermediate.
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