Significantly reduced leakage currents in organic thin film transistors with Mn‐doped Bi2Ti2O7 high‐k gate dielectrics |
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| Authors: | Kwang‐Hwan Cho Min‐Gyu Kang Ho Won Jang Hyun Yong Shin Chong‐Yun Kang Seok‐Jin Yoon |
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| Affiliation: | 1. Department of Materials Science, University of Wisconsin‐Madison, Madison, Wisconsin 53706, USA;2. Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 130‐650, Korea;3. Department of Electronics Engineering, Namseoul University, Cheonan 331‐707, Korea |
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| Abstract: | We report the fabrication of organic thin‐film transistors (OTFTs) with high‐k gate dielectrics of Mn‐doped Bi2Ti2O7 (BTO) films. 3% Mn‐doped BTO films deposited on polymer substrates by pulsed laser deposition at room temperature exhibit low leakage currents of 2.1 × 10–8 A/cm2 at an applied electric field of 0.3 MV/cm, while undoped BTO films show much higher leakage currents of 4.3 × 10–4 A/cm2. Mn doping effectively reduces the number of oxygen vacancies in the films and improves the electrical properties. Low operation voltage and significantly reduced leakage currents are demonstrated in pentacene‐based OTFTs with the Mn‐doped BTO gate dielectrics. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
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| Keywords: | OTFT high‐k gate dielectrics BiTiO leakage currents |
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