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Design and maskless fabrication of ultrathin suspended membranes of GaN |
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| Authors: | I M Tiginyanu V Popa M A Stevens‐Kalceff D Gerthsen P Brenner D Pavlidis |
| Institution: | 1. Institute of Electronic Engineering and Nanotechnologies, Academy of Sciences of Moldova, Chisinau 2028, Moldova;2. National Center for Materials Study and Testing, Technical University of Moldova, Chisinau 2004, Moldova;3. School of Physics, University of New South Wales, Sydney NSW 2052, Australia;4. Laboratory for Electron Microscopy, University of Karlsruhe, Karlsruhe 76128, Germany;5. Institute of Electronics, Microelectronics and Nanotechnology, Cité Scientifique, BP 60069, 59652 Villeneuve d'Ascq Cedex, France |
| Abstract: | We report the maskless fabrication of ultrathin suspended GaN membranes designed by focused ion beam treatment of the GaN epilayer surface with subsequent photoelectrochemical etching. This technological approach allows the fabrication of ultrathin membranes, as well as supporting micro/nanocolumns in a controlled fashion. The analysis of the spatial and spectral distribution of microcathodoluminescence demonstrates that the membranes exhibit mainly yellow luminescence. These results pave the way for the fabrication of ultrathin suspended GaN membranes for MEMS/NEMS applications.  |
| Keywords: | ultrathin membranes GaN focused ion beams photoelectrochemical etching |