Thermal imaging of microwave fields inside the surfatron and the microwave plasma torch |
| |
| Affiliation: | 1. Department of Chemistry, Universiti Teknologi Malaysia, 81310 UTM Skudai, Johor Darul Ta’zim, Malaysia;2. Centre for Sustainable Nanomaterials (CSNano), Ibnu Sina Institute for Scientific and Industrial Research, Universiti Teknologi Malaysia, 81310 UTM Skudai, Johor Darul Ta’zim, Malaysia;1. National Research Center “Kurchatov Institute”, Moscow, Russia;2. OAO Kompozit Company, Korolev, Russia;3. NPO GIPO Company, Kazan, Russia;1. College of Humanities and Social Sciences, Applied psychology, China Medical University, Shenyang 110001, China;2. Department of Psychiatry, The First Hospital of China Medical University, Shenyang 110001, China;3. The Research Center for Medical Genomics, Key Laboratory of Cell Biology, Ministry of Public Health, Key Laboratory of Medical Cell Biology, Ministry of Education, China Medical University, Shenyang 110001, China;1. EcoTopia Science Institute, Nagoya University, Nagoya 464-8603, Japan;2. ITER Organization, 13115 St. Paul-lez-Durance, France;3. Japan Atomic Energy Agency, Naka, Ibaraki 801-1, Japan;1. National Engineering Laboratory for Coal-fired Pollutants Emission Reduction, Shandong Provincial Key Lab of Energy Carbon Reduction and Resource Utilization, Shandong University, Jinan 250061, China;2. School of Environmental Science and Engineering, Shandong University, Jinan 250100, China;1. Department of Chemistry, Wake Forest University, Salem Hall, Box 7486, Winston-Salem, NC, 27109, USA;2. Spectrometry, Sample Preparation and Mechanization Group (GEPAM), Institute of Chemistry, University of Campinas, PO Box 6154, Campinas, SP, 13083-970, Brazil;3. Group for Applied Instrumental Analysis, Department of Chemistry, Federal University of São Carlos, PO Box 676, São Carlos, SP, 13565-905, Brazil |
| |
| Abstract: | A new method is introduced for imaging microwave fields, such as those found in microwave-plasma support structures. The method relies upon the darkening that such fields cause in heat-sensitive paper, such as that used in some telefax printers. With this new method, the microwave-frequency electric fields inside two microwave-plasma support structures, the surfatron and the microwave plasma torch, have been measured and subsequently imaged in three dimensions. The images reveal that the surfatron and microwave plasma torch have different operational behavior. As expected, the electric field strength inside the surfatron exponentially falls off down the length of the quartz plasma tube. The field inside the microwave plasma torch initially diminishes, but then increases in strength towards the end of the tube. An aerosol was introduced into the surfatron to observe the effect of water vapor on the electric field strength and distribution. The exponential axial decay of the electric field in the ‘dry’ surfatron plasma, characteristic of a surface wave propagating down a quartz plasma tube, is extended further down the quartz tube in the ‘wet’ plasma. A drop in plasma conductivity is likely the origin of the elongated propagation of the surface wave. |
| |
| Keywords: | |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
