Room-temperature electroluminescence from erbium-doped amorphous hydrogenated silicon

We have studied electroluminescence (EL) in the amorphous silicon-based erbium-doped structures under reverse bias in the temperature range 77–300 K. The intensity of electroluminescence at the wavelength of 1.54 μm exhibits a maximum near the room temperature. The excitation of erbium ions occurs by an Auger process which involves the capture of conduction electrons by neutral dangling bonds (D⁰-centers) located close to erbium ions. The stationary current through the structure is kept by a reverse process of thermally activated tunnel emission of electrons from negatively charged dangling-bond defects (D⁻-centers) to the conduction band of the amorphous matrix. A theoretical model proposed explains consistently all of our experimental data.