Wet-chemical etching of Mn-Zn ferrite by focused Ar+-laser irradiation in H3PO4 |
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Authors: | Yong Feng Lu M Takai S Nagatomo S Namba |
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Institution: | (1) Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, 560 Osaka, Japan;(2) D. S. Scanner Co., Ltd., Izumimachi, Higashiku, 540 Osaka, Japan |
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Abstract: | Maskless etching of Mn-Zn ferrite in H3PO4 aqueous solution by Ar+-ion laser irradiation has been investigated to obtain high etching rates and aspect-ratios of etched grooves. The etching
processes have been found to be photochemical in the low laser power region and thermochemical in the high laser power region.
High etching rates of up to 340 μm/s and an aspect-ratio of 30 for slab structures have been achieved. In the case of high
aspect-ratio structure, the etching rate was limited by the low diffusion efficiency of etched products in the etchant. Periodic
ripple structures have been observed under specific etching conditions. |
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Keywords: | 81 40 82 65 |
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