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~(32)S离子辐照PET薄膜制备亚微米孔径核孔膜研究
引用本文:张璐,吴振东,肖德涛,梁海英,鞠薇,陈东风,傅元勇.~(32)S离子辐照PET薄膜制备亚微米孔径核孔膜研究[J].原子核物理评论,2014,31(4):528-532.
作者姓名:张璐  吴振东  肖德涛  梁海英  鞠薇  陈东风  傅元勇
作者单位:南华大学,湖南 衡阳 421001;
摘    要:使用中国原子能科学研究院HI-13串列加速器产生的32S离子轰击BOPET薄膜,薄膜在空气中陈化3个月后在专用装置中使用Na OH溶液蚀刻制备核孔膜,研究Na OH溶液浓度、蚀刻温度对微孔孔形的影响。在不同温度和蚀刻液浓度条件下,蚀刻出微孔孔径为0.2至0.93μm的亚微米核孔膜,计算其微孔锥角,得出微孔锥角随着蚀刻温度、蚀刻液浓度和微孔孔径的变化趋势。研究表明,采用低浓度、高温度的Na OH溶液蚀刻有利于减小微孔锥角,有利于制备较小孔径的核孔膜。如选用0.5mol/L的Na OH溶液浓度,在蚀刻温度为90℃的条件下蚀刻,此时蚀刻时间小于2 h,既可以得到高质量微孔膜也有利于提高生产效率。

关 键 词:核孔膜    锥角    32S  离子    PET膜
收稿时间:1900-01-01

Study on Submicro Track Etched Membrane Fabrication Using 32S Irradiated PET
ZHANG Lu,WU Zhendong,XIAO Detao,LIANG Haiying,JU Wei,CHEN Dongfeng,FU Yuanyong.Study on Submicro Track Etched Membrane Fabrication Using 32S Irradiated PET[J].Nuclear Physics Review,2014,31(4):528-532.
Authors:ZHANG Lu  WU Zhendong  XIAO Detao  LIANG Haiying  JU Wei  CHEN Dongfeng  FU Yuanyong
Institution:University of South China, Hengyang 421001, Hunan, China;
Abstract:The PET membranes are irradiated by 32S ions. The 32S ions were produced by the HI-13 tandem accelerator in China Institute of Atomic Energy. The membranes used for the experiment have been aged in air for three months. The PET membranes are etched in the particular device. Sodium hydroxide solution is used as etchant. The effects of different concentration of sodium hydroxide solution and etching temperature on the pore shape have been studied. The pores have a diameter of 0.2~ 0.93 μm respectively in differentmembranes and the taper angle have been calculated. The pore diameter, etchant concentration and etching temperature respectively as a function of the taper angle under different etching conditions are displayed. The experiment result showed that low concentrations of sodium hydroxide solution with high temperature make the pore taper angle and pore size relatively smaller and the pore more close to a cylinder which enables us to conclude the proper etching condition for producing. Meanwhile, Pore taper angle was relatively minimal on 0.5 mol/L sodium hydroxide solution, at 90 ℃ with etching time in 2 hours.
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