Deposition of fullerene films from the ablation plasma generated by high-power ion beams on graphite targets

A possibility of deposing carbon films with a high content of C₆₀ and C₇₀ fullerenes from an ablation plasma generated as a result of irradiation of graphite targets by pulsed high-power ion beams is shown. The relative contents of the crystalline diamond-like carbon phase, crystalline fullerene phase, and amorphous carbon phase have been determined by X-ray diffraction analysis for different deposition conditions. The nanohardness and Young’s modulus of the deposited films and their adhesion to the single-crystal silicon substrate have been measured.