| 多元离子束增强沉积在新型薄膜材料上的应用 |
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| 引用本文： | 张涛,李国卿.多元离子束增强沉积在新型薄膜材料上的应用[J].原子核物理评论,1997,14(3):173-176. |
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| 作者姓名： | 张涛 李国卿 |
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| 作者单位： | 1 北京师范大学低能核物理所国家教委射线束材料工程开放实验室;2 大连理工大学三束实验室 |
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| 摘 要： | 采用Ｎ＋＋Ｃｒ＋多元离子束增强沉积合成（ＴｉＣｒ）Ｎ膜层，对膜层进行了ＡＥＳ、ＴＥＭ和ＸＲＤ分析．测试了膜基体系的力学性能和电化学性能．与普通物理气相沉积相比，多元离子束增强沉积显示了开发新型薄膜材料的较强潜力． Multicomponent ion beam enhanced deposition was used to synthesize (TiCr)N films. The films were characterized by AES,TEM and XRD methods. The electrochemical property and mechanics property of the films were measured. The experimental results show that the multicomponent ion beam enhanced deposition has stronger potential of new material development than physical vapour deposition.
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| 关 键 词： | 离子束 薄膜 （TiCr）N |
| 收稿时间： | 1900-01-01 |
Applications of Multicomponent Ion Beam Enhanced Deposition in New Film Material |
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| Institution: | 1 Institute of Low Energy Nuclear Physics; Beijing Normal University; Radiation Beam & Materials Engineering Laboratory of State Education Committee of China; Three Beam Laboratory,Dalian University of Technology |
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| Abstract: | Multicomponent ion beam enhanced deposition was used to synthesize (TiCr)N films. The films were characterized by AES,TEM and XRD methods. The electrochemical property and mechanics property of the films were measured. The experimental results show that the multicomponent ion beam enhanced deposition has stronger potential of new material development than physical vapour deposition. |
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